Atomic oxygen erosion resistance of sol–gel oxide films on Kapton
Source abstract
Abstract
Silica, alumina and silica-alumina composite films were deposited on Kapton substrate via sol–gel method and their atomic oxygen (AO) erosion resistance was test in a ground-based AO simulator. The surface morphology and the structure of as-deposited films were investigated by scanning electronic microscope, X-ray photoelectron spectroscopy, and Fourier transformed infrared spectroscopy. After AO exposure, more cracks and micro-pores appear on the surface of silica and alumina films, respectively. For the silica-alumina composite films, their toughness and densification are good, and the stable interface is formed between the alumina and silica phases. Therefore, the silica-alumina composite-coated Kapton shows the best AO resistance and the erosion yield is two orders of magnitude less than that of pristine Katpon. Moreover, the composite-coated Kapton remains optically stable under AO exposure.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Semiconductor materials and devices · Catalytic Processes in Materials Science · Silicone and Siloxane Chemistry
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (28)
Show source-provided references
1. Reddy MR (1995) J Mater Sci 30:281–30710.1007/BF00354389 ↗
2. Packirisamy S, Schwam D, Litt MH (1995) J Mater Sci 30:308–32010.1007/BF00354390 ↗
3. Hench LL, West JK (1990) Chem Rev 90:33–7210.1021/cr00099a003 ↗
4. Ding XZ, He YZ, Dong Y (1994) Mater Sci Eng 12:1–810.1016/0927-796X(94)90005-1 ↗
5. Zhang X, Wu YY, Liu G et al (2008) Thin Solid Films 516:5020–502610.1016/j.tsf.2008.01.023 ↗
6. Xie YY, Gao Y, Qin XG et al (2012) Surf Coat Technol 206:4384–438810.1016/j.surfcoat.2012.04.063 ↗
7. Xing A, Gao Y, Yin JG et al (2010) Appl Surf Sci 256:6133–613810.1016/j.apsusc.2010.03.133 ↗
8. Xiao F, Wang K, Zhan MS (2010) Appl Surf Sci 256:7384–738810.1016/j.apsusc.2010.05.077 ↗
9. Duo SW, Li MS, Zhu M et al (2008) Mater Chem Phys 112:1093–109810.1016/j.matchemphys.2008.07.036 ↗
10. Duo SW, Li MS, Zhu M et al (2006) Surf Coat Technol 200:6671–667710.1016/j.surfcoat.2005.09.028 ↗
11. Zhang X, Wu YY, He SY et al (2009) Mater Chem Phys 114:179–18410.1016/j.matchemphys.2008.09.002 ↗
12. Zhang X, Wu YY, He SY et al (2007) Surf Coat Technol 201:6051–605810.1016/j.surfcoat.2006.11.012 ↗
13. Zhang X, Wu YY, He SY (2010) Hebei J Ind Sci Technol 27:149–152 (in Chinese)
14. Banks BA, de Groh KK, Bansey-Barton E et al (1996) SAE Tech Pap Ser 01:2695
15. Kurokawa Y, Suga T, Nakata S et al (1998) J Mater Sci Lett 17:275–27810.1023/A:1006517219037 ↗
16. Pach L, Majling J (2000) J Sol Gel Sci Technol 18:99–10310.1023/A:1008786617134 ↗
17. Banks BA, Miller SK, de Groh KK (2004) NASA/TM 213223
18. Grossman E, Lifshitz Y, Wolan JT et al (1999) J Spacecr Rockets 36:75–7810.2514/2.3435 ↗
19. Golub MA, Wydeven T, Cormia RD (1988) Polym Commun 29:285–288
20. Herreros B, He H, Barr TL et al (1994) J Phys Chem 98:1302–130510.1021/j100055a042 ↗
21. Parola VL, Deganello G, Scire S et al (2003) J Solid State Chem 174:482–48810.1016/S0022-4596(03)00321-9 ↗
22. Orefice RL, Vasconcelos WL (1997) J Sol Gel Sci Technol 9:239–249
23. Urretavizcaya G, Cavalieri AL, Lopez JMP et al (1998) J Mater Synth Process 6:1–710.1023/A:1022674107059 ↗
24. Innocenzi P (2003) J Non Cryst Solids 316:309–31910.1016/S0022-3093(02)01637-X ↗
25. Padmaja P, Warrier KGK, Padmanabhan M et al (2006) Mater Chem Phys 95:56–6110.1016/j.matchemphys.2005.05.044 ↗
26. Fang YT, Liang XH, Fan J (2004) Chin J Mater Res 18:641–646 (in Chinese)
27. Wang XC, Shi SL, Cheng ZQ et al (2000) Chin J Mater Res 14:51–55 (in Chinese)
28. Fuller J Final Performance Report Grant: F49620-02-1-0323