journal article·2010-09Open access

Numerical simulation of the liquid phase in SnO2 thin film deposition by sol-gel-dip-coating

Dayene M. Carvalho, Jorge L. B. Maciel, Leandro P. Ravaro, Rogério E. Garcia, Valdemir G. Ferreira, Luis V. A. Scalvi

Abstract

The fluid flow of the liquid phase in the sol-gel-dip-coating process for SnO2 thin film deposition is numerically simulated. This calculation yields useful information on the velocity distribution close to the substrate, where the film is deposited. The fluid modeling is done by assuming Newtonian behavior, since the linear relation between shear stress and velocity gradient is observed. Besides, very low viscosities are used. The fluid governing equations are the Navier–Stokes in the two dimensional form, discretized by the finite difference technique. Results of optical transmittance and X-ray diffraction on films obtained from colloidal suspensions with regular viscosity, confirm the substrate base as the thickest part of the film, as inferred from the numerical simulation. In addition, as the viscosity increases, the fluid acquires more uniform velocity distribution close to the substrate, leading to more homogenous and uniform films.
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Research context

OpenAlex topics: Fluid Dynamics and Thin Films · Characterization and Applications of Magnetic Nanoparticles · Nanofluid Flow and Heat Transfer

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

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