journal article·2016-01

Dependence of intermetallic compound formation on the sublayer stacking sequence in Ag–Sn bilayer thin films

P.J. Rossi, N. Zotov, E. Bischoff, E.J. Mittemeijer

Acta Materialia· Volume 103
Publisher page

Abstract

Abstract Intermetallic compound (IMC) formation in thermally-evaporated Ag–Sn bilayer thin films has been investigated employing especially X-ray diffraction (XRD) and (S)TEM methods. The specific IMCs that are present in the as-deposited state depend sensitively on the stacking sequence of the sublayers. In case of Sn on top of Ag, predominantly Ag 3 Sn is formed, whereas Ag 4 Sn is predominantly present in the as-deposited state for Ag on top of Sn. In the latter case this is accompanied by an extremely fast uptake of a large amount of Sn by the Ag sublayer, leaving behind macroscopic voids in the Sn sublayer. The results are discussed on the basis of the thermodynamics and kinetics of (IMC) product-layer growth in thin films. It is shown that both thermodynamic and kinetic arguments explain the contrasting phenomena observed.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Electronic Packaging and Soldering Technologies · Metallurgical and Alloy Processes · Surface and Thin Film Phenomena

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (54)

Show source-provided references
1. Directive 2002/95/EC of the European Parliament and of the Council of 27 January 2003 on the restriction of the use of certain hazardous substances in electrical and electronic equipment
2. Characterization of the reaction process in diffusion-soldered Cu/In-48 at.% Sn/Cu joints10.1016/S0254-0584(02)00192-X ↗
3. Phase characterisation and kinetic behaviour of diffusion soldered Cu/In/Cu interconnections10.1179/026708303225009706 ↗
4. Lead-free soldering – where the world is going
5. Advances in lead-free electronics soldering10.1016/S1359-0286(00)00036-X ↗
6. Microstructure and mechanical properties of Sn-Bi, Sn-Ag and Sn-Zn lead-free solder alloys10.1016/j.jallcom.2013.03.234 ↗
7. Ag3Sn plate formation in the solidification of near ternary eutectic Sn-Ag-Cu alloys10.1557/JMR.2002.0402 ↗
8. Effects of intermetallic formation at the interface between copper and lead-tin solder10.1007/BF01111916 ↗
9. Effect of intermetallic compounds on the thermal fatigue of surface mount solder joints10.1109/96.554534 ↗
10. Residual stress and interfacial reaction of the electroplated Ni-Cu alloy under bump metallurgy in the flip-chip solder joint10.1007/s11664-004-0021-1 ↗
11. Constitution of the alloys of silver and tin
12. The Ag-Sn (silver-tin) system10.1007/BF02869270 ↗
13. Diffusion of gold and silver in tin single crystals10.1063/1.1708821 ↗
14. “Fast” diffusion in alloys10.1016/0040-6090(75)90247-3 ↗
15. Mössbauer spectroscopy of isotope separator implanted 119Sn in fcc metals10.1088/0305-4608/9/1/006 ↗
16. Diffusion of cadmium, indium, and tin in single crystals of silver10.1103/PhysRev.96.610 ↗
17. Kinetics of reaction at room temperature in thin silver-metal couples10.1016/0040-6090(91)90265-Y ↗
18. Interfacial reactions in bimetallic Ag-Sn thin film couples10.1016/0040-6090(87)90069-1 ↗
19. Room-temperature reactions in thin metal couples10.1023/A:1004317123677 ↗
20. Room temperature interactions in Ag-metals thin film couples10.1016/0040-6090(79)90457-7 ↗
21. Room temperature interfacial reactions in electrodeposited Au/Sn couples10.1016/j.actamat.2008.08.002 ↗
22. 2007
23. 2005
24. Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings10.1116/1.1312732 ↗
25. Vacuum-deposited gold films. I. Factors affecting the film morphology10.1016/0039-6028(92)90188-C ↗
26. Stress and grain growth in thin films10.1016/0022-5096(96)00022-1 ↗
27. Study on texture evolution and properties of silver thin films prepared by sputtering deposition10.1063/1.368794 ↗
28. Magnetic, X-ray and TEM studies of several multilayer systems
29. Lattice spacing relationships and the electronic structure of H.C.P. phases based on silver10.1080/14786436108244417 ↗
30. Redetermination of the crystal structure of Ag3Sn
31. Grain structure variation with temperature for evaporated metal films10.1116/1.572727 ↗
32. Dislocation node determinations of the stacking fault energy in silver-tin alloys10.1016/0001-6160(67)90191-5 ↗
33. X-Ray diffraction study of the effects of solutes on the occurrence of stacking faults in silver-base alloys10.1063/1.1702428 ↗
34. Hirth · 1982
35. Gottstein · 2004
36. Secondary grain growth in thin films of semiconductors: theoretical aspects10.1063/1.336194 ↗
37. Abnormal growth of “giant” grains in silver thin films10.1016/S1359-6454(00)00372-4 ↗
38. Effects of residual S on Kirkendall void formation at Cu/Sn-3.5Ag solder joints10.1016/j.actamat.2008.07.022 ↗
39. Kirkendall void formation in thin-film diffusion couples10.1063/1.91696 ↗
40. Room temperature interdiffusion studies of Au/Sn thin film couples10.1016/0040-6090(81)90468-5 ↗
41. de Boer · 1988
42. The surface energy of metals10.1016/S0039-6028(98)00363-X ↗
43. Surface compositions of copper-silicon alloys10.1016/0378-5963(83)90049-1 ↗
44. Formation, oxidation, electronic, and electrical properties of copper silicides10.1063/1.345369 ↗
45. On the influence of the stacking sequence in the nucleation of Cu3Si: experiment and the testing of nucleation models10.1016/j.actamat.2014.05.006 ↗
46. Interface growth mechanism in ion beam sputtering-deposited Mo/Si multilayers10.1080/14786430600640502 ↗
47. Rossi · 2014 · 41
48. Interfaces in lead-free solder alloys: enthalpy of formation of binary Ag-Sn, Cu-Sn and Ni-Sn intermetallic compounds10.1016/j.tca.2007.04.004 ↗
49. A calorimetric investigation of the system silver-tin at 450 °C10.1016/0001-6160(55)90061-4 ↗
50. Compound phase formation in thin film structures10.1080/10408439991329161 ↗
51. Gale · 2004
52. Mittemeijer · 2010 · 371
53. Kinetics of the motion of the interface during mutual diffusion in a two-component system
54. Growth kinetics of planar binary diffusion couples: “Thin-film case” versus “bulk cases”10.1063/1.331028 ↗