Quantitative strain analysis and growth mode of pulsed laser deposited epitaxial CoFe2O4 thin films
Source abstract
Abstract
Abstract A microstructural investigation of epitaxial CoFe 2 O 4 films grown by pulsed laser deposition on single crystal SrTiO 3 substrates was performed. We quantitatively analysed the microscopic mechanisms for structural mismatch compensation and the mode of the film growth. X-ray diffraction revealed very low microstrain in all three crystallographic directions of the film, which together with the lattice strain is not large enough to compensate effectively for the mismatch. Quantitative high-resolution transmission electron microscopy showed that most of the compensation occurs by formation of (4 0 0) edge dislocations in the film. These dislocations are concentrated within a critical layer above which a change from layer-by-layer growth to island growth was observed. These observations closely correspond to characteristics of the Stranski–Krastanov growth mode. Atomic force microscopy studies confirmed that during the post-annealing long-range mass diffusion takes place, which facilitates the relaxation of the microstrain during this treatment.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Multiferroics and related materials · Magnetic Properties and Synthesis of Ferrites · Magnetic properties of thin films
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (14)
Show source-provided references
1. Zheng · Science · 2004 · 303 · 66110.1126/science.1094207 ↗
2. Nan · J Appl Phys · 2008 · 103 · 03110110.1063/1.2836410 ↗
3. Zhou · Appl Phys Lett · 2006 · 88 · 01311110.1063/1.2162262 ↗
4. Yan · J Appl Phys · 2008 · 104 · 12391010.1063/1.3033371 ↗
5. Axelsson · Thin Solid Films · 2009 · 517 · 374210.1016/j.tsf.2009.01.142 ↗
6. Margulies · Phys Rev Lett · 1997 · 79 · 516210.1103/PhysRevLett.79.5162 ↗
7. Suzuki · Annu Rev Mater Res · 2001 · 31 · 26510.1146/annurev.matsci.31.1.265 ↗
8. Thang · J. Magn Magn Mater · 2007 · 310 · 262110.1016/j.jmmm.2006.11.048 ↗
9. Hu · Phys Rev B · 2000 · 62 · R77910.1103/PhysRevB.62.R779 ↗
10. Mitra · 1996 · vol. 2
11. Valant · J Optoelectron Adv Mater · 2007 · 9 · 1377
12. Valant · Adv Funct Mater · 2010 · 20 · 64410.1002/adfm.200901762 ↗
13. Venables · 2000
14. Huang · J Cryst Growth · 2007 · 300 · 42610.1016/j.jcrysgro.2007.01.004 ↗