Kinetics of phase formation in binary thin films: the Ni/Al case
Source abstract
Abstract
The growth and/or dissociation of the intermetallic phases which are produced by interdiffusion in metallic thin film multilayers is studied by an approach based on a concentration-dependent diffusivity. No assumption is made on the a priori presence of seed layers of the phases that are expected to grow. Application to the Ni/Al system gives a good agreement with the experimental data reported in the literature.
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Research context
OpenAlex topics: Surface and Thin Film Phenomena · Electronic Packaging and Soldering Technologies · Copper Interconnects and Reliability
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (34)
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