Antiphase boundaries in GaP layers grown on (001) Si by chemical beam epitaxy

Abstract We have investigated the origin of contrast features observed in coalesced GaP islands, deposited by chemical beam epitaxy on (001) Si, by high resolution transmission electron microscopy and conventional dark field electron microscopy. Our results indicate that these features are antiphase boundaries (APBs) lying on {110} planes. Image simulations have been performed to show that APBs can only be seen under specific defocus conditions in high resolution lattice images. The observed contrast is attributed to the presence of Ga–Ga and P–P wrong bonds at APBs. A model is proposed to show that the coalescence of GaP islands on the same Si terrace may not produce APBs, and the formation of such boundaries may require the presence of monoatomic steps, separating the coalescing islands.