journal article·2016-04

Interdiffusion in epitaxial, single-crystalline Au/Ag thin films studied by Auger electron spectroscopy sputter-depth profiling and positron annihilation

Martin A. Noah, David Flötotto, Zumin Wang, Markus Reiner, Christoph Hugenschmidt, Eric J. Mittemeijer

Acta Materialia· Volume 107
Publisher page

Abstract

Abstract Interdiffusion in epitaxial, single-crystalline Au/Ag bilayered thin films on Si (001) substrates was investigated by Auger electron spectroscopy (AES) sputter-depth profiling and by in-situ positron annihilation Doppler broadening spectroscopy (DBS). By the combination of these techniques identification of the role of vacancy sources and sinks on interdiffusion in the Au/Ag films was possible. It was found that with precise knowledge of the concentration-dependent self-diffusion and impurity diffusion coefficients a distinction between the Darken-Manning treatment and Nernst-Planck treatment can be made, which is not possible on the basis of the determined concentration-depth profiles alone.
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Research context

OpenAlex topics: Muon and positron interactions and applications · Copper Interconnects and Reliability · Semiconductor materials and interfaces

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