Systematic investigation of the effect of Ni concentration in Cu-xNi/Sn couples for high temperature soldering

High temperature solders have experienced a marked increase in demand due to the boom of high power interconnects in electric vehicles and the miniaturisation of electronic devices. Transient liquid phase (TLP) bonding is a promising technology for these applications. Alloys from the Cu-Sn system widely used in conventional soldering processes have potential for high temperature applications if the relatively low melting point Sn phase can be consumed in a TLP process. This process results in a joint composed of Cu6Sn5 or Cu3Sn intermetallic compounds (IMCs) which have higher melting points than Sn. Alloying Ni to the Cu substrate promotes the growth rate of the (Cu,Ni)6Sn5 IMCs, significantly reduces the TLP processing time and costs, while suppressing the formation of (Cu,Ni)3Sn. However, the properties of the (Cu,Ni)6Sn5 formed also change significantly depending on the Ni concentration in the system. In this work, the composition, morphology, grain sizes and crystal structure of the (Cu,Ni)6Sn5 formed via the reaction of Sn and Cu-xNi substrates of different Ni concentrations are studied in detail via electron microscopy and synchrotron powder X-ray diffraction to provide a basis for further understanding of the physical, electrical and mechanical properties. The findings are further verified by density functional theory calculations. Additionally, the complex interplay of grain boundary diffusion rates and the IMC nucleation rate which accelerate with increasing Ni concentration, along with the Cu-xNi dissolution rate and the crystal growth rate which decrease with increasing Ni concentration are identified to be the main factors affecting the IMC growth rates.