In-Situ Surface-Roughness Measurements during the Preparation of Chemically Etched Porous Silicon
Source abstract
Abstract
We have monitored the stain-etching of silicon in real time using neutron reflection. The etching process does not occur uniformly with time and possible dynamics of the process is under consideration. Distinct irregularities are produced on the PS surface and some gas bubbling from the cell is observed.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Silicon Nanostructures and Photoluminescence · Thin-Film Transistor Technologies · Nanowire Synthesis and Applications
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References (5)
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