Synthesis of nanoporous platinum thin films and application as hydrogen sensor
Source abstract
Abstract
A nanoporous platinum (np-Pt) thin film based hydrogen sensor was fabricated and studied. The np-Pt thin films were fabricated through a method of chemical dealloying and coarsening starting from a CuPt alloy. The alloy thin films of CuxPt1−x were deposited by sputtering copper and platinum at the same time. The dealloying process completely removed the copper from the film. We demonstrate a method to control the porosity of np-Pt by a method of coarsening. Scanning electron microscopy confirmed the presence of porosity with size ranging from a few nanometers to tens of nanometers. A sensor device with four electrodes was fabricated on the np-Pt thin films using a stainless steel mask and by sputtering copper. The electrical characteristics of the sensor exhibit marked sensitivity or current changes in the presence of hydrogen. The results demonstrate that np-Pt thin films configured as a gas sensor have high sensitivity to hydrogen.
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Research context
OpenAlex topics: Nanoporous metals and alloys · Electrocatalysts for Energy Conversion · Anodic Oxide Films and Nanostructures
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (21)
Show source-provided references
1. A. Prakash, A.V. McCormick, M.R. Zachariah, Chem. Mater. 16, 1466 (2004)10.1021/cm034740t ↗
2. S.B. Yoon, J.Y. Kim and J.-S. Yu, Chem. Commun. (14), 1536 (2002)10.1039/b202307p ↗
3. J. Erlebacher, M.J. Aziz, A. Karma, N. Dimitrov, K. Sieradzki, Nature 410, 450 (2001)10.1038/35068529 ↗
4. A.J. Forty, Nature 282, 597 (1979)10.1038/282597a0 ↗
5. R. Li, K. Sieradzki, Phys. Rev. Lett. 68, 1168 (1992)10.1103/PhysRevLett.68.1168 ↗
6. J. Erlebacher, K. Sieradzki, Scripta Mater. 49, 991 (2003)10.1016/S1359-6462(03)00471-8 ↗
7. X. Lu, E. Bischoff, R. Spolenak, T.J. Balk, Scripta Mater. 56, 557 (2007)10.1016/j.scriptamat.2006.12.022 ↗
8. S. Parida, D. Kramer, C.A. Volkert, H. Rosner, J. Erlebacher, J. Weissmuller, Phys. Rev. Lett. 97, 035504 (2006)10.1103/PhysRevLett.97.035504 ↗
9. C. Zhao, Z. Qi, X. Wang, Z. Zhang, Corros. Sci. 51, 2120 (2009)10.1016/j.corsci.2009.05.043 ↗
10. W.J. Yeh, S. Chava, J. Vac. Sci. Technol. B Microelectron. Nanometer Struct. 27, 923 (2009)10.1116/1.3032903 ↗
11. H.B. Lu, Y. Li, F.H. Wang, Scripta Mater. 56, 165 (2007)10.1016/j.scriptamat.2006.09.009 ↗
12. L. Sun, C.-L. Chien, P.C. Searson, Chem. Mater. 16, 3125 (2004)10.1021/cm0497881 ↗
13. G.S. Attard, P.N. Bartlett, N.R.B. Coleman, J.M. Elliott, J.R. Owen, J.H. Wang, Science 278, 838 (1997)10.1126/science.278.5339.838 ↗
14. P. Jiang, J.F. Bertone, V.L. Colvin, Science 291, 453 (2001)10.1126/science.291.5503.453 ↗
15. X. Peng, K. Koczkur, S. Nigro and A, Chen, Chem. Commun. (24), 2872 (2004)10.1039/b412677g ↗
16. L. Hongtao et al., Nanotechnology 17, 2167 (2006)10.1088/0957-4484/17/9/015 ↗
17. J.C. Thorp, K. Sieradzki, L. Tang, P.A. Crozier, A. Misra, M. Nastasi, D. Mitlin, S.T. Picraux, Appl. Phys. Lett. 88, 033110 (2006)10.1063/1.2161939 ↗
18. A. Antoniou, D. Bhattacharrya, J.K. Baldwin, P. Goodwin, M. Nastasi, S.T. Picraux, A. Misra, Appl. Phys. Lett. 95, 073116 (2009)10.1063/1.3194109 ↗
19. J.-F. Huang, I.W. Sun, Chem. Mater. 16, 1829 (2004)10.1021/cm030462m ↗
20. D.V. Pugh, A. Dursun, S.G. Corcoran, J. Mater. Res. 18, 216 (2003)10.1557/JMR.2003.0030 ↗
21. J. Erlebacher, J. Electrochem. Soc. 151, C614 (2004)10.1149/1.1784820 ↗