Synthesis of hydrophilic nickel zinc ferrite thin films by chemical route for supercapacitor application
Source abstract
Abstract
Nanostructured nickel zinc ferrite (NZF) thin films were synthesized via chemical deposition method (CDM). This deposition process was based on the thermal decomposition of ammonia complex ions at 328 K. The pH of the bath solution was varied from 9.8, 9.9 and 10.0 to study its effect on the structural, morphological and electrochemical properties. The structural studies of oxide films were carried out using X-ray diffraction and FT-IR technique. All studies indicate nickel zinc ferrite phase formation with spinel crystal structure having improved intensity at increasing pH. Scanning electron microscopy reveals that morphology gets changed from grain like to hexagonal flakes which also increased the surface-to-volume ratio. The contact angle was improved from hydrophilic to super hydrophilic due to porous nature. Along with this, to propose NZF thin films for possible application in energy storage devices, its electrochemical supercapacitor properties have been studied in aqueous KOH electrolyte. The NZF thin film synthesized at pH 9.9 have shown high specific capacitance of 67 Fg−1.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Supercapacitor Materials and Fabrication · Copper-based nanomaterials and applications · Advancements in Battery Materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (29)
Show source-provided references
1. B.E. Conway, Electrochemical Supercapacitors (Kluwer/Plenum, New York, 1999)10.1007/978-1-4757-3058-6 ↗
2. S. Trasatti, P. Kurzweil, Platinum Met. Rev. 38, 46 (1994)10.1595/003214094X3824656 ↗
3. S. Sarangapani, B.V. Tilak, C.P. Chen, J. Electrochem. Soc. 143, 3791 (1996)10.1149/1.1837291 ↗
4. D.A. Glocker, Handbook of Thin Film Process Technology, eds. by D.A. Glocker, S.I. Shah (Institute of Physics Publishing, Bristol and Philadelphia, 1998)
5. Q. Tian, J. Li, Q. Wang, S. S. Wang, X. Zhang, Thin Solid Films 518, 313 (2009)10.1016/j.tsf.2009.06.042 ↗
6. B.J. Yoon, S.H. Jeong, K.H. Lee, H.S. Kim, C.G. Park, J.H. Han, Chem. Phys. Lett. 388, 170 (2004)10.1016/j.cplett.2004.02.071 ↗
7. C. Arbizzani, M. Mastragostino, F. Soavi, J. Power Source 100, 164 (2001)10.1016/S0378-7753(01)00892-8 ↗
8. E. Frackowiak, F. Beguin, Carbon 40, 1775 (2002)10.1016/S0008-6223(02)00045-3 ↗
9. J.P. Zheng, T.R. Jow, J. Electrochem. Soc. 142, L6 (1995)10.1149/1.2043984 ↗
10. E. Frackowiak, V. Khomenko, K. Jurewicz, K. Lota, F. Baguin, J. Power Source 153, 413 (2006)10.1016/j.jpowsour.2005.05.030 ↗
11. S.L. Kuo, N.L. Wu, J. Power Source 162, 1437 (2006)10.1016/j.jpowsour.2006.07.056 ↗
12. S.L. Kuo, N.L. Wu, Electrochem. Solid-State Lett. 8, A495 (2005)10.1149/1.2008847 ↗
13. D. Hama, J. Chang, S.H. Pathan, W.Y. Kim, R.S. Mane, B.N. Pawar, O.S. Joo, H. Chung, M.Y. Yoon, S.H. Han, Curr. Appl. Phys. 9, S98 (2009)10.1016/j.cap.2008.08.042 ↗
14. T. Cottineau, M. Toupin, T. Delahaye, T. Brousse, D. Belanger, Appl. Phys. A 82, 599 (2006)10.1007/s00339-005-3401-3 ↗
15. P. Sen, A. De, Electrochim. Acta 55, 4677 (2010)10.1016/j.electacta.2010.03.077 ↗
16. U.M. Patil, K.V. Gurava, V.J. Fulari, C.D. Lokhande, O.S. Joo, J. Power Source 188, 338 (2009)10.1016/j.jpowsour.2008.11.136 ↗
17. L. Cao, L.B. Kong, Y.Y. Liang, H.L. Li, Chem. Commun. 14, 1646 (2004)10.1039/b401922a ↗
18. A.I. Inamdar, Y.S. Kim, S.M. Pawar, J.H. Kim, H. Im, H. Kim, J. Power Source 196, 2393 (2011)10.1016/j.jpowsour.2010.09.052 ↗
19. S.M. Pawar, B.S. Pawar, J.H. Kim, O.S. Joo, C.D. Lokhande, Curr. Appl. Phys. 11, 1 (2010)
20. S.H. Yu, M. Yoshimura, Adv. Funct. Mater. 12, 9 (2002)10.1002/1616-3028(20020101)12:1<9::AID-ADFM9>3.0.CO;2-A ↗
21. C.D. Lokhande, P.S. Patil, H. Tributsch, A. Ennaoui, Sol. Energy Mater. Sol. Cells 55, 379 (1998)10.1016/S0927-0248(98)00112-3 ↗
22. D.K. Pawar, S.M. Pawar, P.S. Patil, S.S. Kolekar, J. Alloys Compd. 509, 3587 (2011)10.1016/j.jallcom.2010.12.079 ↗
23. C.D. Lokhande, A.M. More, J.L. Gunjakar, J. Alloys Compd. 486, 570 (2009)10.1016/j.jallcom.2009.07.009 ↗
24. S.S. Latthe, H. Imai, V. Ganesan, A.V. Rao, J. Appl. Surf. Sci. 256, 217 (2009)10.1016/j.apsusc.2009.07.113 ↗
25. S. Chou, F. Cheng, J. Chen, J. Power Source 162, 727 (2006)10.1016/j.jpowsour.2006.06.033 ↗
26. S.C. Wang, C.Y. Chen, T.C. Chien, P.Y. Lee, C.K. Lin, Thin Solid Films 517, 1234 (2008)10.1016/j.tsf.2008.06.042 ↗
27. G.R. Li, Z.P. Feng, J.H. Zhong, Z.L. Wang, Y.X. Tong, Macromolecules 43, 2178 (2010)10.1021/ma902317k ↗
28. C.D. Lokhande, D.P. Dubal, O.S. Joo, Curr. Appl. Phys. 11, 255 (2011)10.1016/j.cap.2010.12.001 ↗
29. V. Subramanian, S.C. Hall, P.H. Smith, B. Rambabu, Solid State Ion 175, 511 (2004)10.1016/j.ssi.2004.01.070 ↗