journal article·2024-12-12

Ambipolar Seebeck Coefficient in MoS2/MoS2–MoO2 Graded Composites by Junction Reciprocation

Abinaya Rengarajan, Mohamed Jibri Khaja Peer, Harish Santhana Krishnan, Ponnusamy Suruttaiya Udaiyar, Archana Jayaram, Navaneethan Mani

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Abstract

We fabricated radially transformed growth of MoS 2 to MoS 2 –MoO 2 by the two-zone chemical vapor transport (CVT) technique. The idea to apply heat, i.e., hot junction ( T H ), on both the edges of the film has a distinct ambipolar Seebeck coefficient ( S ) of −20 μVK –1 with MoS 2 as hot junction, and 69.5 μVK –1 with MoS 2 –MoO 2 as hot junction. The positive S at MoS 2 –MoO 2 indicates fast hole injection at a lower degree of interface Fermi-level pinning and large asymmetry at the junctions through low energy carrier scattering in the multiple potential barriers at the interfaces of each region. The decreased Θ D around 5 K than MoS 2 reveals the lattice softening due to reduced strength of chemical bonding at MoS 2 –MoO 2 . The report propounds the potential utilization of multiple potential barriers for thin film graded composites in thermoelectric applications.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: 2D Materials and Applications · Advanced Thermoelectric Materials and Devices · MXene and MAX Phase Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Center of Excellence in Materials and Advanced Technologies (CeMAT), Faculty of Engineering and Technology, SRM institute of Science and Technology, Kattankulathur 603 203, India

Department of Physics and Nanotechnology, SRM Institute of Science and Technology, Kattankulathur 603 203, India

Nanotechnology Research Centre (NRC), Faculty of Engineering and Technology, SRM institute of Science and Technology, Kattankulathur 603 203, India

Funding

Science and Engineering Research Board · SRM Institute of Science and Technology

References (39)

Show source-provided references
1. 10.1038/nmat209010.1038/nmat2090 ↗
2. 10.1073/pnas.151023111210.1073/pnas.1510231112 ↗
3. 10.1039/C6EE02488B10.1039/C6EE02488B ↗
4. 10.1002/adfm.20190178910.1002/adfm.201901789 ↗
5. Rowe D. M. · AIP Conf. Proc. · 1994 · 316 · 33910.1063/1.46827 ↗
6. 10.1039/D0TA02629H10.1039/D0TA02629H ↗
7. 10.1021/acs.nanolett.8b0517410.1021/acs.nanolett.8b05174 ↗
8. 10.1038/s41586-018-0574-410.1038/s41586-018-0574-4 ↗
9. 10.1021/nl404350510.1021/nl4043505 ↗
10. 10.1002/adfm.20110211110.1002/adfm.201102111 ↗
11. 10.1021/ar500280m10.1021/ar500280m ↗
12. 10.1038/ncomms1490310.1038/ncomms14903 ↗
13. 10.1088/0957-4484/18/11/11571710.1088/0957-4484/18/11/115717 ↗
14. 10.1039/C6CP02027E10.1039/C6CP02027E ↗
15. 10.1016/j.ceramint.2017.05.22010.1016/j.ceramint.2017.05.220 ↗
16. 10.1063/5.015111710.1063/5.0151117 ↗
17. 10.1021/acs.jpclett.3c0351210.1021/acs.jpclett.3c03512 ↗
18. 10.1021/acs.cgd.7b0148610.1021/acs.cgd.7b01486 ↗
19. 10.1021/acs.cgd.1c0039010.1021/acs.cgd.1c00390 ↗
20. 10.1021/acsnano.5b0791610.1021/acsnano.5b07916 ↗
21. 10.1038/s41699-017-0010-x10.1038/s41699-017-0010-x ↗
22. 10.1021/acs.chemmater.1c0017410.1021/acs.chemmater.1c00174 ↗
23. 10.1063/5.019044710.1063/5.0190447 ↗
24. 10.1038/srep2117110.1038/srep21171 ↗
25. 10.1039/C8CE00576A10.1039/C8CE00576A ↗
26. 10.1038/srep2808810.1038/srep28088 ↗
27. 10.1088/2053-1583/aa5b0110.1088/2053-1583/aa5b01 ↗
28. 10.1063/5.002171510.1063/5.0021715 ↗
29. 10.1038/s41699-023-00406-z10.1038/s41699-023-00406-z ↗
30. 10.1021/acs.chemmater.0c0038810.1021/acs.chemmater.0c00388 ↗
31. 10.1021/nl200773n10.1021/nl200773n ↗
32. 10.1021/acs.jpcc.3c0384710.1021/acs.jpcc.3c03847 ↗
33. 10.1103/PhysRevB.101.20530210.1103/PhysRevB.101.205302 ↗
34. 10.1016/j.cej.2021.12848410.1016/j.cej.2021.128484 ↗
35. 10.1002/smll.20120287610.1002/smll.201202876 ↗
36. 10.1063/5.009093210.1063/5.0090932 ↗
37. 10.1016/0022-3697(73)90092-910.1016/0022-3697(73)90092-9 ↗
38. Srivastava G. P. · 1990
39. 10.1103/PhysRevLett.110.09550310.1103/PhysRevLett.110.095503 ↗