journal article·2009-09

Growth mechanisms of Cu3Sn on polycrystalline and single crystalline Cu substrates

P.J. Shang, Z.Q. Liu, X.Y. Pang, D.X. Li, J.K. Shang

Acta Materialia· Volume 57· Issue 16
Publisher page

Abstract

A comprehensive transmission electron microscopy (TEM) study was conducted to investigate the growth mechanisms of Cu3Sn on polycrystalline and single crystalline Cu substrates in solder joints. On single crystalline Cu the solder reflow process resulted in the growth of columnar Cu3Sn grains aligned in a thin uniform layer perpendicular to the interface, while a thick Cu3Sn layer formed from fine equiaxed grains on the polycrystalline substrate. In the subsequent solid state aging, columnar growth of Cu3Sn continued on the single crystalline Cu before it was replaced by nucleation and growth of new triangular Cu3Sn grains at the triple junction sites of the Cu/ Cu3Sn interface. On the polycrystalline Cu the solid state aging caused much more rapid growth of the Cu3Sn layer due to nucleation and the growth of new Cu3Sn grains at both the Cu/Cu3Sn and Cu6Sn5/Cu3Sn interfaces. These different growth behaviors of Cu3Sn were related to the diffusive supply of reactive elements.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Electronic Packaging and Soldering Technologies · 3D IC and TSV technologies · Advanced Welding Techniques Analysis

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (24)

Show source-provided references
1. Laurila · Mater Sci Eng R · 2005 · 49 · 110.1016/j.mser.2005.03.001 ↗
2. Tu · Acta Metall · 1973 · 21 · 34710.1016/0001-6160(73)90190-9 ↗
3. Tu · Acta Metall · 1982 · 30 · 94710.1016/0001-6160(82)90201-2 ↗
4. Mei · Metall Mater Trans A · 1992 · 23 · 85710.1007/BF02675563 ↗
5. Onishi · Tran Jpn Inst Met · 1975 · 16 · 53910.2320/matertrans1960.16.539 ↗
6. Vianco · J Electron Mater · 1994 · 23 · 72110.1007/BF02651365 ↗
7. Choi · J Electron Mater · 1999 · 28 · 120910.1007/s11664-999-0159-y ↗
8. Li · Acta Mater · 2006 · 54 · 290710.1016/j.actamat.2006.02.030 ↗
9. Rönkä · Metall Mater Trans A · 1998 · 29 · 295110.1007/s11661-998-0202-2 ↗
10. Zeng · Mater Sci Eng R · 2002 · 38 · 5510.1016/S0927-796X(02)00007-4 ↗
11. Gusak · Phys Rev B · 2002 · 66 · 11540310.1103/PhysRevB.66.115403 ↗
12. Zou · Acta Mater · 2008 · 56 · 264910.1016/j.actamat.2008.01.055 ↗
13. Tu · Mater Sci Eng R · 2001 · 34 · 110.1016/S0927-796X(01)00029-8 ↗
14. Liu · Scripta Mater · 2005 · 53 · 63110.1016/j.scriptamat.2005.05.033 ↗
15. Shang · Scripta Mater · 2008 · 58 · 40910.1016/j.scriptamat.2007.10.025 ↗
16. Paul · Z Metallkd · 2004 · 95 · 91310.3139/146.018032 ↗
17. Vuorinen · J Electron Mater · 2007 · 36 · 135510.1007/s11664-007-0251-0 ↗
18. Shim · J Electron Mater · 2000 · 29 · 114510.1007/s11664-000-0005-8 ↗
19. Shang · Scripta Mater · 2008 · 59 · 31710.1016/j.scriptamat.2008.03.031 ↗
20. Suh · J Appl Phys · 2007 · 102 · 06351110.1063/1.2776002 ↗
21. Bader · J Welding · 1969 · 48 · 551
22. Kidson · J Nucl Mater · 1961 · 3 · 2110.1016/0022-3115(61)90175-1 ↗
23. Wu · J Electron Mater · 1993 · 22 · 76910.1007/BF02817353 ↗
24. Peng · Microelectron Reliab · 2007 · 47 · 216110.1016/j.microrel.2006.12.006 ↗