journal article·2011-03-10

Negative Differential Resistance of Oligo(Phenylene Ethynylene) Self-Assembled Monolayer Systems: The Electric-Field-Induced Conformational Change Mechanism

Hyungjun Kim, Seung Soon Jang, Richard A. Kiehl, William A. Goddard

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Abstract

We investigate here a possible mechanism for the room temperature negative differential resistance (NDR) in the Au/AN-OPE/RS/Hg self-assembled monolayer (SAM) system, where AN-OPE = 2′-amino,5′-nitro-oligo(phenylene ethynylene) and RS is a C 14 alkyl thiolate. Kiehl and co-workers showed that this molecular system leads to NDR with hysteresis and sweep-rate-dependent position and amplitude in the NDR peak. To investigate a molecular basis for this interesting behavior, we combine first-principles quantum mechanics (QM) and mesoscale lattice Monte Carlo methods to simulate the switching as a function of voltage and voltage rate, leading to results consistent with experimental observations. This simulation shows how the structural changes at the microscopic level lead to the NDR and sweep-rate-dependent macroscopic I−V curve observed experimentally, suggesting a microscopic model that might aid in designing improved NDR systems.
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Research context

OpenAlex topics: Molecular Junctions and Nanostructures · Advanced Memory and Neural Computing · Advanced biosensing and bioanalysis techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Graduate School of EEWS (WCU), Korea Advanced Institute of Science and Technology, Daejeon 305-701, Republic of Korea

Materials and Process Simulation Center, California Institute of Technology, Pasadena, California 91125, United States

School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332-0245, United States

Department of Electrical and Computer Engineering, University of California, Davis, California 95616, United States

References (34)

Show source-provided references
1. Esaki L. · Phys. Rev. · 1958 · 109 · 60310.1103/PhysRev.109.603 ↗
2. Xue Y. Q. · Phys. Rev. B · 1999 · 59 · R785210.1103/PhysRevB.59.R7852 ↗
3. Selzer Y. · Angew. Chem., Int. Ed. · 2002 · 41 · 82710.1002/1521-3773(20020301)41:5<827::AID-ANIE827>3.0.CO;2-N ↗
4. Pitters J. L. · Nano Lett. · 2006 · 6 · 39010.1021/nl0521569 ↗
5. Kiehl R. A. · Appl. Phys. Lett. · 2006 · 88
6. Tao N. J. · Nat. Nanotechnol. · 2006 · 1 · 17310.1038/nnano.2006.130 ↗
7. Chen J. · Science · 1999 · 286 · 155010.1126/science.286.5444.1550 ↗
8. Guisinger N. P. · Proc. Natl. Acad. Sci. U.S.A. · 2005 · 102 · 883810.1073/pnas.0501214102 ↗
9. He J. · J. Am. Chem. Soc. · 2005 · 127 · 1193210.1021/ja0532279 ↗
10. Salomon A. · J. Am. Chem. Soc. · 2004 · 126 · 1164810.1021/ja049584l ↗
11. Kratochvilova I. · J. Mater. Chem. · 2002 · 12 · 292710.1039/b203047k ↗
12. Rawlett A. M. · Appl. Phys. Lett. · 2002 · 81 · 304310.1063/1.1512815 ↗
13. Amlani I. · Appl. Phys. Lett. · 2002 · 80 · 276110.1063/1.1469655 ↗
14. Donhauser Z. J. · Science · 2001 · 292 · 230310.1126/science.1060294 ↗
15. Fan F. R. F. · J. Am. Chem. Soc. · 2004 · 126 · 256810.1021/ja038189c ↗
16. Seminario J. M. · J. Am. Chem. Soc. · 2000 · 122 · 301510.1021/ja992936h ↗
17. Xiao X. Y. · J. Am. Chem. Soc. · 2005 · 127 · 923510.1021/ja050381m ↗
18. Reed M. A. · Appl. Phys. Lett. · 2001 · 78 · 373510.1063/1.1377042 ↗
19. Chen J. · Appl. Phys. Lett. · 2000 · 77 · 122410.1063/1.1289650 ↗
20. Sollner T. C. L. G. · Appl. Phys. Lett. · 1983 · 43 · 58810.1063/1.94434 ↗
21. Tsuchiya M. · Jap. J. Appl. Phys., Part 2: Lett. · 1985 · 24 · L46610.1143/JJAP.24.L466 ↗
22. Qiu X. H. · Phys. Rev. Lett. · 2004 · 93 · 4
23. Akdim B. · J. Phys. Chem. C · 2008 · 112 · 317010.1021/jp7110132 ↗
24. Troisi A. · Nano Lett. · 2004 · 4 · 59110.1021/nl0352088 ↗
25. Emberly E. G. · Phys. Rev. B · 2001 · 6412
26. Galperin M. · Nano Lett. · 2005 · 5 · 12510.1021/nl048216c ↗
27. Kresse G. · Phys. Rev. B · 1996 · 54 · 1116910.1103/PhysRevB.54.11169 ↗
28. Jaguar package, V. 6.5 ed.Schroedinger Inc.:Portland, OR, 2005.
29. Schultz, P.SeqQuest program;Sandia National Laboratories:Albuquerque, NM, 2003.
30. Kim Y. H. · Phys. Rev. Lett. · 2005 · 94
31. Mayo S. L. · J. Phys. Chem. · 1990 · 94 · 889710.1021/j100389a010 ↗
32. Lo W. S. · Phys. Rev. A · 1990 · 42 · 747110.1103/PhysRevA.42.7471 ↗
33. Stokbro K. · Mol. Electron. Iii · 2003 · 1006 · 212
34. Candra, P.University of Minnesota, 2006.