journal article·2011-04-07

Study of the TiO to Anatase Transformation by Thermal Oxidation of Ti Film in Air

Chung-Ho Kao, Sung-Wei Yeh, Hsing-Lu Huang, Dershin Gan, Pouyan Shen

The Journal of Physical Chemistry C· Volume 115· Issue 13
Publisher page

Abstract

The TiO to anatase phase transformation has been studied by transmission electron microscopy in this Article. It is shown that prior formation of TiO from Ti film can induce the formation of anatase by thermal oxidation in air; otherwise only rutile is formed. Ti film deposited on the NaCl (001) surface is induced to form epitaxial TiO film by thermal oxidation in air. Further thermal oxidation in air partially transformed TiO into anatase (A) with a parallel orientation relationship of {200} A //{200} TiO . Detailed analysis of the lattice fringes image of the specimen reveals the presence of very high density of misfit dislocations. The TiO to anatase transformation is reversible as further annealing in a vacuum can turn the anatase back into TiO and eliminates the misfit dislocations. The transformation is analyzed in terms of the crystal structure, orientation relationship, and the dislocation distribution, which show that the TiO to anatase transformation is due to the close similarity between their structures.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: TiO2 Photocatalysis and Solar Cells · Advanced Photocatalysis Techniques · Gas Sensing Nanomaterials and Sensors

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Materials and Optoelectronic Science, Center for nanoscience and nanotechnology, National Sun Yat-Sen University, Kaohsiung, Taiwan

Department of Mechanical Engineering, Chinese Military Academy, Kaohsiung, Taiwan

References (33)

Show source-provided references
1. Grätzel M. · Chem. Phys. Lett. · 1985 · 118 · 47410.1016/0009-2614(85)85335-5 ↗
2. Augustynski J. · Electrochim. Acta · 1993 · 38 · 4310.1016/0013-4686(93)80008-N ↗
3. Gnaser H. · Encycl. Nanosci. Nanotechnol. · 2004 · 6 · 505
4. Gao L. · Scr. Mater. · 2001 · 44 · 119510.1016/S1359-6462(01)00681-9 ↗
5. Muscat J. · Phys. Rev. B · 2002 · 65 · 22411210.1103/PhysRevB.65.224112 ↗
6. Stafford U. · Chem. Phys. Lett. · 1993 · 205 · 5510.1016/0009-2614(93)85166-L ↗
7. Georg R. · J. Phys. Chem. · 1995 · 99 · 421510.1021/j100012a050 ↗
8. Hurum D. C. · J. Phys. Chem. B · 2003 · 107 · 454510.1021/jp0273934 ↗
9. Gribb A. A. · Am. Mineral. · 1997 · 82 · 71710.2138/am-1997-7-809 ↗
10. Zhang H. · J. Mater. Chem. · 1998 · 8 · 207310.1039/a802619j ↗
11. Regan B. O. · Nature · 1991 · 353 · 73710.1038/353737a0 ↗
12. Zhang Z. · J. Phys. Chem. B · 1998 · 102 · 1087110.1021/jp982948+ ↗
13. Huang S. Y. · J. Electrochem. Soc. · 1995 · 142 · L14210.1149/1.2048726 ↗
14. Kavan L. · J. Electrochem. Soc. · 1996 · 143 · 39410.1149/1.1836455 ↗
15. Wicaksana D. · J. Vac. Sci. Technol., A · 1992 · 10 · 147910.1116/1.578269 ↗
16. Xu W. W. · Mater. Res. Bull. · 1990 · 25 · 138510.1016/0025-5408(90)90221-M ↗
17. Suhail M. H. · J. Appl. Phys. · 1992 · 71 · 142110.1063/1.351264 ↗
18. Radecka M. · Appl. Surf. Sci. · 1993 · 65 · 22710.1016/0169-4332(93)90663-V ↗
19. Lee W. G. · Thin Solid Films · 1994 · 237 · 10510.1016/0040-6090(94)90245-3 ↗
20. Krishna D. S. R. · Surf. Coat. Technol. · 2005 · 198 · 44710.1016/j.surfcoat.2004.10.102 ↗
21. Ting C. C. · J. Appl. Phys. · 2000 · 88 · 462810.1063/1.1309039 ↗
22. Ting C. C. · Thin Solid Films · 2002 · 402 · 29010.1016/S0040-6090(01)01675-3 ↗
23. Lee K. S. · Scr. Mater. · 2003 · 48 · 65910.1016/S1359-6462(02)00561-4 ↗
24. Kitazawa S. · Vacuum · 2004 · 74 · 63710.1016/j.vacuum.2004.01.048 ↗
25. Hengerer R. · Surf. Sci. · 2000 · 460 · 16210.1016/S0039-6028(00)00527-6 ↗
26. Rez P. · Microsc. Microanal. Microstruct. · 1995 · 6 · 43310.1051/mmm:1995133 ↗
27. Yao J. · Vacuum · 2007 · 81 · 102310.1016/j.vacuum.2006.11.002 ↗
28. Zribi M. · Thin Solid Films · 2008 · 516 · 147610.1016/j.tsf.2007.07.195 ↗
29. Hass G. · Vacuum · 1952 · 2 · 33110.1016/0042-207X(52)93783-4 ↗
30. Sáfrán G. · Thin Solid Films · 1993 · 229 · 3710.1016/0040-6090(93)90406-F ↗
31. Reed-Hill, R. E.; Abbaschian, R.Physical Metallurgy Principles;Thomson:Boston, 1991; p288.
32. Briggs, D.; Seah, M. P.Practical Surface Analysis. Vol. 1. Auger and X-ray Photoelectron Spectroscopy;John Wiley and Sons:Chichester, UK, 1990; p635.
33. Tu, K. N.; Mayer, J. W.; Feldman, L. C.Electronic Thin Film Science;Macmillan:New York, 1992; p163.