journal article·2008-12-04

Catalyst-Free Growth of Well Vertically Aligned GaN Needlelike Nanowire Array with Low-Field Electron Emission Properties

Chaotong Lin, Guanghui Yu, Xinzhong Wang, Mingxia Cao, Haifeng Lu, Hang Gong, Ming Qi, Aizhen Li

The Journal of Physical Chemistry C· Volume 112· Issue 48
Publisher page

Abstract

An array of high-density, vertically aligned GaN nanowires is fabricated through thermal evaporation of GaN powder with the assistance of HCl gas. All GaN nanowires with needlelike tips are well-aligned with the axis direction perpendicular to the substrate without the use of catalysts. A possible growth mechanism of the vertical GaN nanowires array is proposed. Furthermore, field emission measurement shows that the obtained GaN nanowires array has a lower turn-on field of 2.1 V/μm, and the current density is about 1 mA/cm (2) at a bias field of 4.5 V/μm, which means such GaN nanowires are good candidates for large area and uniform flat display applications.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: GaN-based semiconductor devices and materials · ZnO doping and properties · Ga2O3 and related materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of microsystem and information technology, Chinese Academy of Sciences, Shanghai 200050, People’s Republic of China

References (27)

Show source-provided references
1. Qian F. · Nano Lett. · 2004 · 4 · 197510.1021/nl0487774 ↗
2. Choi H. · Phys. Chem. B · 2003 · 107 · 872110.1021/jp034734k ↗
3. Dobrokhotov V. · J. Appl. Phys. · 2006 · 99 · 10430210.1063/1.2195420 ↗
4. Huang Y. · Nano Lett. · 2002 · 2 · 10110.1021/nl015667d ↗
5. Lee S. · Nanotechnology · 2007 · 18 · 49570110.1088/0957-4484/18/49/495701 ↗
6. Liu B. D. · J. Phys. Chem. B · 2005 · 109 · 2152110.1021/jp052351b ↗
7. Ha B. · J. Phys. Chem. B · 2005 · 109 · 1109510.1021/jp044334c ↗
8. Han W. Q. · Science · 1997 · 277 · 128710.1126/science.277.5330.1287 ↗
9. Duan X. F. · J. Am. Chem. Soc. · 2000 · 122 · 18810.1021/ja993713u ↗
10. Ng D. K. T. · Nanotechnology · 2007 · 18 · 37570710.1088/0957-4484/18/37/375707 ↗
11. Chen X. · Adv. Mater. · 2000 · 12 · 143210.1002/1521-4095(200010)12:19<1432::AID-ADMA1432>3.0.CO;2-X ↗
12. Chen C.-C. · J. Am. Chem. Soc. · 2001 · 123 · 279110.1021/ja0040518 ↗
13. Baughman R. H. · Science · 2002 · 297 · 78710.1126/science.1060928 ↗
14. Kim H · Nano Lett. · 2004 · 4 · 105910.1021/nl049615a ↗
15. Deb P. · Nano Lett. · 2005 · 5 · 184710.1021/nl0510762 ↗
16. Liu B. · Appl. Phys. Lett. · 2005 · 87 · 07310610.1063/1.2011794 ↗
17. Wang G. T. · Nanotechnology · 2006 · 17 · 577310.1088/0957-4484/17/23/011 ↗
18. Li Q. · Appl. Phys. Lett. · 2008 · 93 · 04311910.1063/1.2965798 ↗
19. Bougrioua Z. · Crystal Growth · 2007 · 309 · 11310.1016/j.jcrysgro.2007.09.030 ↗
20. Hiramatsu K. · Phys. Status Solidi A · 1999 · 176 · 53510.1002/(SICI)1521-396X(199911)176:1<535::AID-PSSA535>3.0.CO;2-I ↗
21. Hersee S. D. · Nano Lett. · 2006 · 6 · 180810.1021/nl060553t ↗
22. Zhang R. · MRS Internet J. Nitride Semicond. Res. · 1999 · 4 · G4.7
23. Sugino T. · Appl. Phys. Lett. · 2002 · 80 · 360210.1063/1.1477622 ↗
24. Wan Q. · Appl. Phys. Lett. · 2003 · 83 · 225310.1063/1.1612899 ↗
25. Yamashita T. · Appl. Phys. Lett. · 2005 · 86 · 08210910.1063/1.1869549 ↗
26. Lee K. · J. Electrochem. Soc. · 2007 · 154 · 10-K87
27. Jang W. · Chem. Phys. Lett. · 2006 · 422 · 4110.1016/j.cplett.2006.02.021 ↗