Catalyst-Free Growth of Well Vertically Aligned GaN Needlelike Nanowire Array with Low-Field Electron Emission Properties
Source abstract
Abstract
An array of high-density, vertically aligned GaN nanowires is fabricated through thermal evaporation of GaN powder with the assistance of HCl gas. All GaN nanowires with needlelike tips are well-aligned with the axis direction perpendicular to the substrate without the use of catalysts. A possible growth mechanism of the vertical GaN nanowires array is proposed. Furthermore, field emission measurement shows that the obtained GaN nanowires array has a lower turn-on field of 2.1 V/μm, and the current density is about 1 mA/cm (2) at a bias field of 4.5 V/μm, which means such GaN nanowires are good candidates for large area and uniform flat display applications.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: GaN-based semiconductor devices and materials · ZnO doping and properties · Ga2O3 and related materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of microsystem and information technology, Chinese Academy of Sciences, Shanghai 200050, People’s Republic of China
References (27)
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