Theoretical Study of Chlorine for Silicon Nanocrystals
Source abstract
Abstract
In the framework of density functional theory we show that a chlorine (Cl) atom prefers residing at the surface of silicon nanocrystals (Si NCs) in single coordination, passivating a Si atom. The surface of Si NCs is covered by H in a very Cl-poor environment, while it may be covered by both H and Cl in a less Cl-poor environment. The Cl coverage increases with the increase of the chemical potential of Cl. At rather high Cl coverage the NC structure is distorted. The band-edge recombination rates of Cl-passivated Si NCs may be significantly larger than that of completely H-passivated ones.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Silicon Nanostructures and Photoluminescence · Semiconductor materials and devices · Thin-Film Transistor Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
State Key Laboratory of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou, Zhejiang 310027, China
References (34)
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