journal article·2011-07-07

Theoretical Study of Chlorine for Silicon Nanocrystals

Yeshi Ma, Xiaobo Chen, Xiaodong Pi, Deren Yang

The Journal of Physical Chemistry C· Volume 115· Issue 26
Publisher page

Abstract

In the framework of density functional theory we show that a chlorine (Cl) atom prefers residing at the surface of silicon nanocrystals (Si NCs) in single coordination, passivating a Si atom. The surface of Si NCs is covered by H in a very Cl-poor environment, while it may be covered by both H and Cl in a less Cl-poor environment. The Cl coverage increases with the increase of the chemical potential of Cl. At rather high Cl coverage the NC structure is distorted. The band-edge recombination rates of Cl-passivated Si NCs may be significantly larger than that of completely H-passivated ones.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Silicon Nanostructures and Photoluminescence · Semiconductor materials and devices · Thin-Film Transistor Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

State Key Laboratory of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou, Zhejiang 310027, China

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