journal article·2004-08

Molecular dynamics simulations of CH3 sticking on carbon surfaces, angular and energy dependence

P Träskelin, E Salonen, K Nordlund, J Keinonen, C.H Wu

Journal of Nuclear Materials· Volume 334· Issue 1
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Abstract

Abstract Sticking cross-sections for CH 3 radicals at different angles of incidence and different energies were calculated using molecular dynamics simulations, employing both quantum-mechanical and empirical force models. The chemisorption of a CH 3 radical at 2100 K onto a dangling bond is found to be highly dependent on the angle of incidence of the incoming radical. The sticking cross-section decreases from (10.4 ± 1.2) to (1.4 ± 0.3) A 2 when the angle of incidence of the methyl radical increases from 0° to 67.5°. A simple geometrical model is presented to explain the angular dependence. In the sticking process of CH 3 radicals with higher kinetic energies (1, 5, and 10 eV) both a fully hydrogen-terminated surface and a surface with dangling bond were studied. The sticking probability is enhanced as the radical energy increases. We observed sticking onto the fully hydrogen-terminated surface for all cases except for the case when the methyl radicals had energies corresponding to a temperature of 2100 K.
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Research context

OpenAlex topics: Catalytic Processes in Materials Science · Quantum, superfluid, helium dynamics · Advanced Chemical Physics Studies

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References (24)

Show source-provided references
1. Larsson · Phys. Rev. B · 1995 · 51 · 1000310.1103/PhysRevB.51.10003 ↗
2. Zhu · Nucl. Instrum. and Meth. B · 1999 · 153 · 21310.1016/S0168-583X(99)00048-8 ↗
3. Winter · J. Nucl. Mater. · 1989 · 161 · 26510.1016/0022-3115(89)90466-2 ↗
4. Federici · J. Nulc. Mater. · 1993 · 207 · 6210.1016/0022-3115(93)90248-W ↗
5. Winter · Plasma Phys. Control. Fus. · 1996 · 38 · 150310.1088/0741-3335/38/9/001 ↗
6. Andrew · J. Nucl. Mater. · 1999 · 153 · 266
7. Rohde · J. Nucl. Mater. · 2001 · 290–293 · 31710.1016/S0022-3115(00)00574-2 ↗
8. von Keudell · J. Nucl. Mater. · 2001 · 290–293 · 23110.1016/S0022-3115(00)00435-9 ↗
9. Vietzke · J. Nucl. Mater. · 1987 · 145–147 · 44310.1016/0022-3115(87)90378-3 ↗
10. Salonen · Contribution Plasma Phys. · 2002 · 42 · 45810.1002/1521-3986(200204)42:2/4<458::AID-CTPP458>3.0.CO;2-9 ↗
11. Harris · Appl. Phys. Lett. · 1989 · 53 · 160510.1063/1.99925 ↗
12. Goodwin · J. Appl. Phys. · 1990 · 68 · 639310.1063/1.346858 ↗
13. von Keudell · Thin Solid Films · 2002 · 402 · 110.1016/S0040-6090(01)01670-4 ↗
14. Meier · J. Appl. Phys. · 2001 · 90 · 358510.1063/1.1397285 ↗
15. Porezag · Phys. Rev. B · 1995 · 51 · 1294710.1103/PhysRevB.51.12947 ↗
16. Elstner · Phys. Rev. B · 1998 · 58 · 726010.1103/PhysRevB.58.7260 ↗
17. Brenner · Phys. Rev. B · 1990 · 42 · 945810.1103/PhysRevB.42.9458 ↗
18. Träskelin · J. Appl. Phys. · 2003 · 93 · 182610.1063/1.1536012 ↗
19. Press · 1995
20. Colla · Radiat. Eff. Def. Solids · 1997 · 142 · 41510.1080/10420159708211623 ↗
21. Meier · New J. Phys. · 2003 · 133 · 1
22. Alfonso · Phys. Rev. B · 1993 · 48 · 1223510.1103/PhysRevB.48.12235 ↗
23. Brooks · J. Nucl. Mater. · 1997 · 241–243 · 29410.1016/S0022-3115(97)80052-9 ↗
24. Roth · Phys. Scr. · 2001 · T91 · 6510.1238/Physica.Topical.091a00065 ↗