journal article·2002-06

The reaction kinetics of lithium salt with water vapor

M. Balooch, L.N. Dinh, D.F. Calef

Journal of Nuclear Materials· Volume 303· Issue 2-3
Publisher page

Abstract

Abstract The interaction of lithium salt (LiH and/or LiD) with water vapor in the partial pressure range of 10 −5 –2657 Pa has been investigated. The reaction probability of water with LiH cleaved in an ultra high vacuum environment was obtained using the modulated molecular beam technique. This probability was 0.11 and independent of LiH surface temperature, suggesting a negligible activation energy for the reaction in agreement with quantum chemical calculations. The value gradually reduced, however, to 0.007 as the surface concentration of oxygen containing product approached full coverage. As the film grew beyond a monolayer, the phase lag of hydrogen product increased from 0 °C to 20 °C and the reaction probability reduced further until it approached our detection limit (∼10 −4 ). This phase lag was attributed to a diffusion-limited process in this regime. For micrometer thick hydroxide films grown in high moisture concentration environment on LiD and LiH, the reaction probability reduced to ∼4×10 −7 and was independent of exposure time. In this regime of thick hydroxide films (LiOH and/or LiOD), microcracks generated in the films to release stress provided easier pathways for moisture to reach the interface. A modified microscope, capable of both atomic force microscopy and nanoindentation, was also employed to investigate the surface morphology of hydroxide monohydrate (LiOH · H 2 O and/or LiOD · H 2 O) grown on hydroxide at high water vapor partial pressures and the kinetics of this growth.
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Research context

OpenAlex topics: Semiconductor materials and devices · ZnO doping and properties · Ferroelectric and Piezoelectric Materials

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