journal article·1992-12

Influence of B2H6/CH4 and B(CH3)3 as process gas on boron carbide coatings: an in situ photoelectron spectroscopy study

H. Künzli, P. Gantenbein, R. Steiner, P. Oelhafen

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OpenAlex topics: Electron and X-Ray Spectroscopy Techniques · Semiconductor materials and devices · Boron and Carbon Nanomaterials Research

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References (8)

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5. Massalski · 1986 · vol. 1
6. Zehringer · J. Nucl. Mater. · 1990 · 176 & 177 · 37010.1016/0022-3115(90)90074-W ↗
7. von Seggern · J. Nucl. Mater. · 1990 · 176 & 177 · 35710.1016/0022-3115(90)90072-U ↗
8. Winter · J. Nucl. Mater. · 1990 · 176 & 177 · 48610.1016/0022-3115(90)90094-4 ↗