Dynamical simulation for sputtering of B4C
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Ion-surface interactions and analysis · Nuclear Materials and Properties · Metal and Thin Film Mechanics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (9)
Show source-provided references
1. Garacia-Rosales · J. Nucl. Mater · 1992 · 189 · 110.1016/0022-3115(92)90413-F ↗
2. Ohtuka · J. Nucl. Mater · 1995 · 222 · 88610.1016/0022-3115(94)00604-0 ↗
3. Isobe · Fusion Eng. Des. · 1995 · 28 · 17010.1016/0920-3796(95)90036-5 ↗
4. Yamamura · Rad. Eff. Defects. Solids · 1997 · 142 · 38510.1080/10420159708211621 ↗
5. Yamamura · Nucl. Instr. and Meth. B · 1987 · 28 · 1710.1016/0168-583X(87)90029-2 ↗
6. Von Oertzen · Surf. Sci. · 1994 · 311 · 32210.1016/0039-6028(94)91422-2 ↗
7. Yamamura · Vacuum · 1985 · 35 · 56110.1016/0042-207X(85)90316-1 ↗
8. Falcone · Appl. Phys. · 1981 · 25 · 30710.1007/BF00902988 ↗
9. Y. Yamamura, N. Itoh, Sputtering yield, in: T. Itoh (Ed.), Ion Beam Assisted Film Growth, ch. 4, Elsevier, Amsterdam, 198910.1016/B978-0-444-87280-7.50009-2 ↗