Dynamics of deuterium implanted in boron coating film for wall conditioning

Abstract Retention and desorption behavior of deuterium implanted into pure boron films has been studied by means of the secondary ion mass spectroscopy. It was found that the process controlling deuterium desorption depended on the temperature. At stage 1, below 573 K, the desorption of deuterium from B–D–B bonds dominated and its diffusion was the rate-determining process. Above 573 K, deuterium was mainly desorbed from B–D bonds, and recombination was the rate-determining process. The effective molecular recombination rate constant of deuterium bound to boron associated with B–D bond was determined by an isothermal annealing experiment.