The thermal properties of high purity and fully dense tungsten produced by chemical vapor deposition

Abstract The ultra-high purity (>99.9999 wt.%) and fully dense (19.23 g/cm 3 ) tungsten (W) by chemical vapor deposition (CVD) was prepared with the deposition rate higher than 0.6 mm/h. The thermal diffusivity, specific heat, heat conductivity and coefficient of thermal expansion of CVD-W at the temperature range of 473–1273 K were measured. Thermal shock tests were carried out on a 60 kW electron-beam material testing scenario to investigate the crack-resistant performance of CVD-W, and the crack initiation threshold energies of CVD-W were achieved in 5 ms heating duration. Compared to forged-W, the higher heat conductivity (160.5–111 W/(m K)) and threshold energy of crack initiation (1.1–1.65 MJ/m 2 ) of CVD-W can be attributed to the material characteristics including high purity, fully dense, rough surface composed of pyramid-like grains, and the columnar grain structures.