journal article·2025-11-14Open access

Rapid, Oxygen-Tolerant, and Versatile Synthesis of Poly(2-(methacryloyloxy)ethyl succinate) Brushes

Jicheng Li, Jannis Schlicke, Jurriaan Huskens

ACS Applied Polymer Materials· Volume 7· Issue 21

Abstract

High Resolution Image Download MS PowerPoint Slide Poly(carboxylic acid) [p(−COOH)] brushes have attracted significant attention across materials science owing to their highly tunable structures and readily modifiable chemistry. However, few reports describe an oxygen-tolerant synthesis of such brushes. Here, we present a facile, oxygen-tolerant protocol for synthesizing poly[2-(methacryloyloxy)ethyl succinate] (pMES) brushes. Three approaches─the dip, coverslip, and droplet approaches─were performed without deliberate deoxygenation, representing closed, semiopen, and open reaction systems, respectively. With the dip approach, controlled brush growth exceeding a 100 nm layer thickness was achieved within 1 h. The coverslip approach exhibited comparable brush growth kinetics, although brush-free regions appeared at the substrate edges due to oxygen diffusion. Brush formation was also demonstrated by the droplet approach but only at increased reducing agent concentrations. These results demonstrate the general and versatile applicability of our protocol for synthesizing this type of p(−COOH) brush. The ease of fabrication without requiring stringent oxygen exclusion may make them more accessible to a wider range of users in both academia and industry.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Polymer Surface Interaction Studies · Dendrimers and Hyperbranched Polymers · Advanced Polymer Synthesis and Characterization

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Molecules and Materials, MESA+ Institute and TechMed Centre, Faculty of Science and Technology, University of Twente, P.O. Box 217, Enschede 7500 AE The Netherlands

Funding

NxtGen HighTech

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