Point defects density influence on the silicon oxide ultrathin film mechanical stress by molecular simulation
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OpenAlex topics: Semiconductor materials and devices · Advanced ceramic materials synthesis · Semiconductor materials and interfaces
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References (11)
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1. Johannessen · J. Appl. Phys. · 1976 · 47 · 710.1063/1.323047 ↗
2. Halicioglu · J. Vac. Sci. Technol. · 1980 · 17 · 121310.1116/1.570641 ↗
3. Tandia · Microelectron. Eng. · 1997 · 33 · 42310.1016/S0167-9317(96)00073-1 ↗
4. Tandia · Solid Thin Films · 1997 · 296 · 12210.1016/S0040-6090(96)09335-2 ↗
5. Levesque · Phys. Rev. · 1973 · A7 · 169010.1103/PhysRevA.7.1690 ↗
6. Metropolis · J. Chem. Phys. · 1953 · 21 · 108710.1063/1.1699114 ↗
7. Binder · 1979
8. Morita · J. Appl. Phys. · 1990 · 68 · 127210.1063/1.347181 ↗
9. Wyckoff Ralph · 1956 · vol. 1
10. A. Tandia, D. Esteve, submitted for publication.
11. Wallace · 1972