Influence of temperature time and depth profiles on the pulsed XeCl laser crystallization of evaporated silicon films
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Thin-Film Transistor Technologies · Laser Material Processing Techniques · Cultural Heritage Materials Analysis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (14)
Show source-provided references
1. Yamauchi · J. Appl. Phys. · 1994 · 75 · 323510.1063/1.356131 ↗
2. Kamins · Sensors Actuators · 1990 · A21–A23 · 81710.1016/0924-4247(90)87039-L ↗
3. Mei · Appl. Phys. Lett. · 1994 · 64 · 113210.1063/1.110829 ↗
4. Sameshima · J. Appl. Phys. · 1993 · 74 · 659210.1063/1.355097 ↗
5. Bachrach · J. Electron. Mater. · 1990 · 19 · 24110.1007/BF02733813 ↗
6. Winer · Appl. Phys. Lett. · 1990 · 57 · 222210.1063/1.103897 ↗
7. Sameshima · J. Appl. Phys. · 1991 · 70 · 128110.1063/1.349584 ↗
8. Haji · J. Appl. Phys. · 1994 · 75 · 394410.1063/1.356014 ↗
9. Baeri · Int. J. Thermophys. · 1993 · 14 · 38310.1007/BF00566038 ↗
10. Im · Appl. Phys. Lett. · 1993 · 63 · 196910.1063/1.110617 ↗
11. Im · Appl. Phys. Lett. · 1994 · 64 · 230310.1063/1.111651 ↗
12. D'Anna · Appl. Phys. · 1993 · A56 · 42910.1007/BF00332576 ↗
13. Miyasaka · Jpn. J. Appl. Phys. · 1994 · 33 · 44410.1143/JJAP.33.444 ↗
14. Fogarassy · Appl. Phys. · 1993 · A56 · 36510.1007/BF00324357 ↗