Post hydrogenation of sputtered amorphous silicon by pressurized water boiling
Source abstract
Abstract
In this paper, we demonstrate that sputtered amorphous silicon films were hydrogenated by means of boiling in water at high pressure. For as-deposited films, infrared (IR) absorption measurements show that hydrogen atoms were evolved by boiling. On the other hand, hydrogen atoms were incorporated for annealed films in which hydrogen was once effused completely.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Thin-Film Transistor Technologies
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References (10)
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