journal article·2000-05

Post hydrogenation of sputtered amorphous silicon by pressurized water boiling

Naomichi Sakamoto, Yamichi Ohmura

Publisher page

Abstract

In this paper, we demonstrate that sputtered amorphous silicon films were hydrogenated by means of boiling in water at high pressure. For as-deposited films, infrared (IR) absorption measurements show that hydrogen atoms were evolved by boiling. On the other hand, hydrogen atoms were incorporated for annealed films in which hydrogen was once effused completely.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Thin-Film Transistor Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (10)

Show source-provided references
1. Lusson · J. Appl. Phys. · 1997 · 81 · 307310.1063/1.364321 ↗
2. Martin · J. Non-Cryst. Solids · 1981 · 45 · 1510.1016/0022-3093(81)90085-5 ↗
3. Pawlewicz · J. Appl. Phys. · 1987 · 49 · 559510.1063/1.324481 ↗
4. Jeffrey · J. Appl. Phys. · 1979 · 50 · 703410.1063/1.325862 ↗
5. Brodsky · Phys. Rev. B · 1977 · 16 · 355610.1103/PhysRevB.16.3556 ↗
6. Ohmura · Appl. Phys. Lett. · 1995 · 67 · 6410.1063/1.115494 ↗
7. Ohmura · Mater. Sci. Forum · 1996 · 258–263 · 185
8. Ohmura · Jpn. J. Appl. Phys. · 1999 · 38 · 404710.1143/JJAP.38.4047 ↗
9. Mayer · J. Non-Cryst. Solids · 1991 · 137&138 · 783
10. Pinarbasi · Thin Solids Films · 1989 · 171 · 21710.1016/0040-6090(89)90045-X ↗