Structural change induced by laser annealing in hydrogenated amorphous silicon films
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Abstract
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Research context
OpenAlex topics: Thin-Film Transistor Technologies · Laser Material Processing Techniques
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References (11)
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1. Weaire · Phil. Mag. B · 1979 · 40 · 24310.1080/13642817908246374 ↗
2. Knights · J. Non-cryst. Solids · 1979 · 32 · 39310.1016/0022-3093(79)90084-X ↗
3. Fritzsche · Appl. Phys. · 1979 · 50 · 336610.1063/1.326326 ↗
4. Brodsky · Appl. Phys. Lett. · 1977 · 30 · 56110.1063/1.89260 ↗
5. John · J. Phys. C · 1981 · 14 · 30910.1088/0022-3719/14/3/014 ↗
6. Magee · 1978 · Vol. 78 · 151
7. Brodsky · Phys. Rev. B · 1977 · 16 · 355610.1103/PhysRevB.16.3556 ↗
8. Zanucchi · J. Appl. Phys. · 1977 · 48 · 522710.1063/1.323553 ↗
9. Knights · Phil. Mag. B · 1978 · 37 · 46710.1080/01418637808225790 ↗
10. Lucovsky · Phys. Rev. B · 1979 · 19 · 206410.1103/PhysRevB.19.2064 ↗
11. Bean · J. Appl. Phys. · 1979 · 50 · 88110.1063/1.326004 ↗