journal article·1987-12

Effect of substrate temperature on the properties of P-doped a-Si:H films prepared at high deposition rate

Masato Ueda, Takeshi Imura, Yukio Osaka

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (7)

Show source-provided references
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4. Ueda · Jpn. J. Appl. Phys. · 1985 · 24 · 79510.1143/JJAP.24.795 ↗
5. Jones · Philos. Mag. · 1977 · 36 · 54110.1080/14786437708239738 ↗
6. Street · Phys. Rev. · 1987 · B35 · 131610.1103/PhysRevB.35.1316 ↗
7. Miyazaki · Solar Energy Mater. · 1984 · 11 · 8510.1016/0165-1633(84)90030-3 ↗