Boron incorporation in hydrogenated amorphous silicon films prepared by chemical vapor deposition
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Thin-Film Transistor Technologies · Silicon and Solar Cell Technologies · Advanced Surface Polishing Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (12)
Show source-provided references
1. Spear · Solid State Commun. · 1975 · 17 · 119310.1016/0038-1098(75)90284-7 ↗
2. Beyer · 1984 · Vol. 21C · 257
3. Magarino · Phil. Mag. · 1982 · B45 · 28510.1080/13642818208246405 ↗
4. Meyerson · J. Appl. Phys. · 1983 · 54 · 146110.1063/1.332172 ↗
5. Bilenchi · Appl. Phys. Lett. · 1985 · 47 · 27910.1063/1.96191 ↗
6. Branz · Appl. Phys. Lett. · 1986 · 48 · 17110.1063/1.96933 ↗
7. Adler · 1984 · Vol. 21A · 291
8. Bilenchi · J. Appl. Phys. · 1982 · 53 · 647910.1063/1.331494 ↗
9. Meunier · Appl. Phys. Lett. · 1983 · 43 · 27310.1063/1.94324 ↗
10. Pan · J. Appl. Phys. · 1987 · 60 · 453510.1063/1.338414 ↗
11. Bock · J. Phys. Chem. · 1986 · 90 · 566910.1021/j100280a039 ↗
12. I. Gianinoni, personal communication.