Optical emission profiles used for a-Si:H deposition rate calculation
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OpenAlex topics: Semiconductor materials and devices · Thin-Film Transistor Technologies · Ion-surface interactions and analysis
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References (5)
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1. Perrin · Chemical Physics · 1982 · 67 · 16710.1016/0301-0104(82)85031-3 ↗
2. Schmitt · J. Of Non-Cryst. Solids · 1983 · 59 & 60 · 64910.1016/0022-3093(83)90257-0 ↗
3. Lees · 1932 · 137 · 173
4. Bugmann · Thesis no 644 · 1986
5. Matsuda · J. of Non-Cryst. Solids · 1983 · 59 & 60 · 68710.1016/0022-3093(83)90264-8 ↗