Application of high-intensity vacuum ultraviolet light for amorphous silicon film fabrication using a windowless photochemical vapor deposition system

journal article·1994-04

Tomo Ueno, Yoshinori Sawado, Takeshi Akiyama, Yoshitaka Iwasaki, Koichi Kuroiwa, Yasuo Tarui

Bibliographic record

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

OpenAlex topics: Thin-Film Transistor Technologies · Semiconductor materials and devices · Glass properties and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Show source-provided references

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