Characteristics of a-Si:H films prepared by a novel laminar flow photo-chemical vapor deposition method

journal article·1996-05

Tetsuya Yamaguchi, Yoshinori Iida, Akihiko Furukawa, Yoshiki Ishizuka, Hidetoshi Nozaki, Sohei Manabe, Hiroyuki Tango, Okio Yoshida

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies

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Show source-provided references

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