journal article·1991

The hydrogen confinement and pipe diffusion in a-Si:H/a-Si3N4:H multilayer

Shuichi Nonomura, Masuyuki Ohta, Hisataka Suzuki, Takahiro Muraki, Shinji Kusakabe, Shoji Nitta

Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (9)

Show source-provided references
1. Triska · Bull. American Physical Society · 1975 · 20 · 392
2. McMillan · J. Appl. Phys. · 1979 · 50 · 523810.1063/1.326672 ↗
3. Carlson · Appl. Phys.Lett. · 1978 · 33 · 8110.1063/1.90153 ↗
4. Beyer · J. Appl. Phys. · 1982 · 53 · 874510.1063/1.330474 ↗
5. Wang · Chinese Phys. Lett. · 1988 · 5 · 4910.1088/0256-307X/5/2/001 ↗
6. Wang · J. Non-Cryst. Solids · 1989 · 114 · 74110.1016/0022-3093(89)90706-0 ↗
7. Yamaguchi · J. Non-Cryst. Solids · 1987 · 97–98 · 93110.1016/0022-3093(87)90224-9 ↗
8. Nitta · 1984 · 715
9. Holt · Matrls. Sci. Res. · 1966 · 3 · 13