journal article·1998-05

Structural relaxation of amorphous silicon during thermal and CW laser annealing

Ozren Gamulin, Mile Ivanda, U.V. Desnica, Krešimir Furić

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Laser Material Processing Techniques · Surface Roughness and Optical Measurements

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References (18)

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