journal article·1991

A novel plasma jet for GeHx-radical generation and a-Ge:H-film deposition

F. Kessler, H.-D. Mohring, G.H. Bauer

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Semiconductor materials and devices

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References (8)

Show source-provided references
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4. Aoki · J. Non-Cryst. Solids · 1989 · 114 · 78910.1016/0022-3093(89)90724-2 ↗
5. Gallagher · J. Appl. Phys. · 1986 · 60 · 136910.1063/1.337312 ↗
6. Hirschfelder · 1964
7. Ruscic · J. Chem. Phys. · 1990 · 92 · 186510.1063/1.458587 ↗
8. Kushner · J. Appl. Phys. · 1988 · 63 · 253210.1063/1.340989 ↗