journal article·1985-12

Structure and chemical composition of glow discharge Si:H,Cl films. The role of gas phase argon addition.

Giovanni Bruno, Pio Capezzuto, Grazia Cicala, Francesco Cramarossa

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Semiconductor materials and devices

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References (10)

Show source-provided references
1. Bruno · 1985 · Vol. 1 · 117
2. Knights · J. Non-Crystalline Solids · 1980 · 35–36 · 15910.1016/0022-3093(80)90589-X ↗
3. Iqbal · Thin Solid Film · 1982 · 87 · 4310.1016/0040-6090(82)90569-7 ↗
4. Iqbal · J. Phys. C: Solid State Phys. · 1983 · 16 · 200510.1088/0022-3719/16/10/029 ↗
5. d'Agostino · Pure and Appl. Chem. · 1985 · 57 · 128710.1351/pac198557091287 ↗
6. Cramarossa · Material Chem. and Phys. · 1983 · 9 · 21310.1016/0254-0584(82)90021-9 ↗
7. Chevallier · J. Non-Crystalline Solids · 1982 · 51 · 27710.1016/0022-3093(82)90148-X ↗
8. Brodsky · Phys. Rev. B · 1977 · 16 · 355610.1103/PhysRevB.16.3556 ↗
9. Wu-Zhi-qiang · J. Non Crystalline Solids · 1983 · 59–60 · 21710.1016/0022-3093(83)90560-4 ↗
10. Bruno · Thin Solid Films · 1983 · 106 · 14510.1016/0040-6090(83)90475-3 ↗