journal article·2004-06

Density-functional calculation of hyperfine interaction constants of dangling bond and weak bond in GeN and SiN films

H. Yokomichi, N. Ishii

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Abstract

Abstract In order to clarify the origin of electron spin resonance (ESR) signals for amorphous germanium nitride (a-GeN), we have carried out the density-functional calculations of 14 N hyperfine interaction constants (HFICs) for Ge-dangling bonds (Ge-DB) and weak Ge–N bonds (deformed N donor). The contribution from the 14 N HFICs of Ge-DB to the ESR line width is nearly equal to that of Si-DB. The decrease in the g -value and the line width observed for a-GeN films with the N concentration originates from a decrease in the anisotropy of the g -tensor due to an increase of the N atoms around the Ge-DBs. The 14 N HFIC calculated for the weak Ge–N bond with a bond length of 2.4 A gives 45 G. It is in good agreement with the hyperfine structure in the ESR signal observed for a-GeN without hydrogenation, suggesting that a-GeN films prepared by sputtering include the weak Ge–N bonds.
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OpenAlex topics: Thin-Film Transistor Technologies · Semiconductor materials and devices · ZnO doping and properties

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