A study on excimer laser amorphous silicon film crystallization
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Thin-Film Transistor Technologies · Laser Material Processing Techniques · Silicon Nanostructures and Photoluminescence
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (14)
Show source-provided references
1. Tannas · IEEE Spectrum · 1989 · 26 · 3410.1109/6.90181 ↗
2. Sameshima · 1990 · 967
3. Sera · IEEE Trans on ED · 1989 · 36 · 286810.1109/16.40970 ↗
4. Shimizu · Jap. J. Appl. Phys. · 1990 · 29 · L177510.1143/JJAP.29.L1775 ↗
5. Bachrach · J. Electr. Mat. · 1990 · 19 · 24110.1007/BF02733813 ↗
6. Winer · Applied Phys. Lett. · 1990 · 57 · 222210.1063/1.103897 ↗
7. Morita · Jap. J. Appl. Phys. · 1989 · 28 · L30910.1143/JJAP.28.L309 ↗
8. Bentini · Appl. Phys. A · 1988 · 45 · 31710.1007/BF00617938 ↗
9. 1989
10. Donovan · J. Appl. Phys. · 1985 · 57 · 179510.1063/1.334406 ↗
11. Wood · Appl. Phys. Lett. · 1984 · 44 · 77010.1063/1.94912 ↗
12. Thompson · Phys Rev. Lett. · 1984 · 52 · 236010.1103/PhysRevLett.52.2360 ↗
13. 1984 · vol.55
14. Narayan · J. Appl. Phys. · 1985 · 57 · 56410.1063/1.334738 ↗