Preparation and properties of glow-discharge deposited amorphous Si:N:H alloys from SiH4, N2, and H2 gases
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OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · ZnO doping and properties
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References (5)
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1. Anderson · Philos. Mag. · 1977 · 35 · 110.1080/14786437708235967 ↗
2. Kurata · Jpn. J. Appl. Phys. · 1981 · 20 · L81110.1143/JJAP.20.L811 ↗
3. Noguchi · Jpn. J. Appl. Phys. · 1982 · 21 · L48510.1143/JJAP.21.L485 ↗
4. Sasaki · J. Appl. Phys. · 1983 · 54 · 269610.1063/1.332293 ↗
5. Sasaki · Jpn. J. Appl. Phys. · 1982 · 21 · 139410.1143/JJAP.21.1394 ↗