Phase transformations in the Cr/a-Si system during low temperature annealing
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Advanced Surface Polishing Techniques · Semiconductor materials and interfaces · Surface Roughness and Optical Measurements
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (15)
Show source-provided references
1. Murarka · 1983
2. 1978
3. Formation and Characterization of Transition-Metal Silicides
4. Botha · Thin Solid Films · 1983 · 105 · 23710.1016/0040-6090(83)90289-4 ↗
5. Walser · Appl. Phys. Lett. · 1976 · 28 · 62410.1063/1.88590 ↗
6. Pretorius · Vacuum · 1990 · 41 · 103810.1016/0042-207X(90)93854-C ↗
7. Colgan · Appl. Phys. Lett. · 1981 · 37 · 93810.1063/1.91767 ↗
8. Yacobi · J. Appl. Phys. · 1980 · 51 · 642410.1063/1.327592 ↗
9. Koster · Thin Solid Films · 1978 · 53 · 12910.1016/0040-6090(78)90025-1 ↗
10. Bost · J. Appl. Phys. · 1988 · 63 · 83910.1063/1.340078 ↗
11. Cytermann · Appl. Phys. Lett. · 1988 · 52 · 19110.1063/1.99516 ↗
12. F. L. Edelman, C. Cytermann, R. Brener, M. Eizenberg, R. Weil, and W. Beyer, J. Appl. Phys., in print.
13. 1985 · 1900
14. Zolotukhin · Sov. Phys. Semicond. · 1976 · 10 · 914
15. Davis · IEEE Trans. Electron Devices · 1980 · ED-37 · 67710.1109/T-ED.1980.19922 ↗