journal article·1989-12

Ar+ laser crystallization of a-Si:H film for active layer of TFT

Xinfan Huang, Zhifeng Li, Qing Gu, Ximao Boa, Kunji Chen

Journal of Non-Crystalline Solids· Volume 115· Issue 1-3
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Laser Material Processing Techniques · Surface Roughness and Optical Measurements

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (5)

Show source-provided references
1. Amorphous silicon thin film and its applications to large-area electronics
2. Material properties controlling the performance of amorphous silicon thin film transistor
3. Laser crystallization of a-Si:H on insulator
4. Bao · Nuclear Instruments and Methods in Physics Research · 1989 · B37/38 · 391
5. Fritzsch · Phys. Rev. · 1983 · B28 · 490010.1103/PhysRevB.28.4900 ↗