Importance of first layer thickness on TFT characteristics using a-Si:H deposited by 2-step process
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Abstract
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Research context
OpenAlex topics: Thin-Film Transistor Technologies · Silicon and Solar Cell Technologies · Surface Roughness and Optical Measurements
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References (5)
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1. Ibaraki · 1992 · 205
2. Watabe · 1994 · 61
3. Takechi · 1993 · 830
4. Kawamura · Ext. Abstr. of the AM-LCD'94 · 1994 · 116
5. Gangulyland · Jpn. J. Appl. Phys. · 1992 · 31 · L126910.1143/JJAP.31.L1269 ↗