journal article·1996-05

Dispersive processes in the annealing of light- and thermally-induced dangling bonds in a-Si:H

K. Takeda, H. Hikita, Y. Kimura, H. Yokomichi, K. Morigaki

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Liquid Crystal Research Advancements · CCD and CMOS Imaging Sensors

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References (6)

Show source-provided references
1. Jackson · Phys. Rev. · 1988 · B37 · 102010.1103/PhysRevB.37.1020 ↗
2. Fujita · Philos. Mag. · 1994 · B69 · 5710.1080/13642819408236879 ↗
3. Zhang · 1994 · 336 · 269
4. Schlesinger · J. Stat. Phys. · 1984 · 36 · 63910.1007/BF01012928 ↗
5. Morigaki · J. Non-Cryst. Solids · 1993 · 164–166 · 21510.1016/0022-3093(93)90529-7 ↗
6. Zhang · 1995