High quality a-Si film produced by horizontal plasma furnace

journal article·1983-12

Yoshio Kashima, Shuichi Nonomura, Hirotsugu Kida, Koji Fukumoto, Hiroaki Okamoto, Yoshihiro Hamakawa

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

OpenAlex topics: Thin-Film Transistor Technologies · Silicon and Solar Cell Technologies · Silicon Carbide Semiconductor Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Show source-provided references

1. Okamoto · Solar Energy Materials · 1980 · 2 · 31310.1016/0165-1633(80)90007-6 ↗

2. Okamoto · Journal of NON-CRYSTALLINE SOLIDS · 1980 · 35 · 20110.1016/0022-3093(80)90594-3 ↗

3. Kuwano · 1982 · 704

4. Hotta · Jpn. J. Appl. Phys. · 1982 · 21 · 28910.7567/JJAPS.21S1.289 ↗

5. Nonomura · Jpn. J. Appl. Phys. · 1982 · 21 · L10.7567/JJAPS.21S2.279 ↗

6. Okamoto · J. Appl. Phys. · 1983 · 54 · 323610.1063/1.332485 ↗

7. S.Nonomura, et al, solar Cells, to be published.