Structural investigation and growth of 〈n〉-type microcrystalline silicon prepared at different plasma excitation frequencies
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Abstract
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Research context
OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies
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References (15)
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1. Curtins · Plasma Chem. Plasma Process. · 1987 · 7 · 26710.1007/BF01016517 ↗
2. Chatham · 1989 · 149 · 447
3. Heintze · 1993 · Vol. 1 · 213
4. Hapke · 1994 · 358 · 745
5. Finger · J. Appl. Phys. Lett. · 1994 · 65 · 258810.1063/1.112604 ↗
6. Finger · 1995
7. Tsai · 1988 · 123
8. Hapke · thesis · 1995
9. Oda · Jpn. J. Appl. Phys. · 1990 · 29 · 188910.1143/JJAP.29.1889 ↗
10. Schwarzenbach · J. Vac. Sci. Technol. · 1996 · A14 · 13210.1116/1.579908 ↗
11. Kroll · 1994
12. Matsuda · 1990 · 164 · 3
13. Veprek · J. Vac. Sci. Tech. · 1989 · A7 · 261410.1116/1.575806 ↗
14. Fang · J. Non-Cryst. Solids · 1991 · 137&138 · 79110.1016/S0022-3093(05)80239-X ↗
15. Heintze · J. Non-Cryst. Solids · 1993 · 164–166 · 98510.1016/0022-3093(93)91163-W ↗