Optical and electrical properties of a-SixNy:H films prepared by rf plasma using N2+SiH4 gas mixtures
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Abstract
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Research context
OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Semiconductor materials and devices
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References (10)
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1. 1986
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5. Canillas · Vacuum · 1990 · 39 · 78510.1016/0042-207X(89)90037-7 ↗
6. Kato · J.Appl.Phys. · 1987 · 62 · 49210.1063/1.339772 ↗
7. Drévillon · Thin Solid Films · 1985 · 130 · 16510.1016/0040-6090(85)90305-0 ↗
8. Watanabe · Thin Solid Films · 1986 · 136 · 7710.1016/0040-6090(86)90110-0 ↗
9. Osenbach · J. Appl. Phys. · 1986 · 60 · 140810.1063/1.337318 ↗
10. Osenbach · J.Electrochem.Soc. · 1989 · 136 · 340910.1149/1.2096462 ↗