journal article·1989-12

Amorphous SiOx:H alloy films as wide optical-gap materials

K. Haga, H. Miura, M. Kumano, H. Watanabe

Journal of Non-Crystalline Solids· Volume 115· Issue 1-3
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · ZnO doping and properties · Ga2O3 and related materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (7)

Show source-provided references
1. Anderson · Philos. Mag. · 1977 · 35 · 110.1080/14786437708235967 ↗
2. Kim · 1985
3. Kurata · Jpn. J. Appl. Phys. · 1981 · 20 · L81110.1143/JJAP.20.L811 ↗
4. Wenyuan · Chinese J. Semicond. · 1982 · 3 · 197
5. Morimoto · Jpn. J. Appl. Phys. · 1987 · 26 · 2210.1143/JJAP.26.22 ↗
6. Otsubo · Jpn. J. Appl. Phys. · 1988 · 27 · L199910.1143/JJAP.27.L1999 ↗
7. Haga · Jpn. J. Appl. Phys. · 1986 · 25 · L3910.1143/JJAP.25.L39 ↗