journal article·1991

Role of ions in formation of amorphous Si:H network in electron cyclotron resonance plasma chemical vapor deposition

Yoshikazu Nakayama, Kohji Hitsuishi, Mei Zhang, Hiroshi Imamura, Takao Kawamura

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (5)

Show source-provided references
1. Nakayama · Appl. Phys. Lett. · 1990 · 57 · 229710.1063/1.103892 ↗
2. Matsuoka · Appl. Phys. Lett. · 1987 · 50 · 186410.1063/1.97719 ↗
3. Matsuo · Jpn. J. Appl. Phys. · 1983 · 22 · L21010.1143/JJAP.22.L210 ↗
4. Hitsuishi · 1990 · 273
5. Chen · 1991 · 19