journal article·1989-12

Boron doping and hydrogenation by ion implantation of a-Si:H

R. Galloni, Y.S. Tsuo, D.W. Baker, F. Zignani

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Silicon and Solar Cell Technologies · Ion-surface interactions and analysis · Semiconductor materials and interfaces

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References (11)

Show source-provided references
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4. Galloni · Nucl. Inst. and Meth. in Phys. Res. · 1989 · B39 · 38610.1016/0168-583X(89)90809-4 ↗
5. Ast · Phil. Mag. · 1980 · B41 · 237
6. Ziegler · 1985 · vol. 1
7. Muller · Phil. Mag. · 1981 · B43 · 41910.1080/01418638108222107 ↗
8. Tsuo · 1988 · 118 · 153
9. Tauc · 1972
10. Johnson · Phys. Rev. · 1987 · B35 · 416610.1103/PhysRevB.35.4166 ↗
11. Pankove · Cryst. Lett. Def. and Amorph. Mat. · 1985 · 11 · 203